Abstract
Boron carbide thin films were deposited on single-crystal silicon substrates with magnetron sputtering method at different temperatures using a sintered B 4C target. Auger electron spectroscopy, Fourier transform infrared spectroscopy and transmission electronic microscopy were employed to characterize their chemical compositions and microstructure. Mechanical properties of the films were evaluated using a nanoindenter. The results show the as-deposited boron carbide films are amorphous or microcrystalline with high hardness and high modulus. With the increase of the substrate temperature, boron carbide films show a tendency of crystallization, and accordingly the hardness and modulus reach 50.4 and 420 GPa from 42.5 and 300 GPa, respectively.
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