Microstructure and hardness of SiC–TiC nanocomposite thin films prepared by radiofrequency magnetron sputtering

Abstract

Silicon carbide–titanium carbide (SiC–TiC) nanocomposite thin films were prepared by radiofrequency magnetron sputtering using SiC–TiC composite targets fabricated by spark plasma sintering. The SiC thin films were amorphous at substrate temperatures below 573K and crystallized in the cubic crystal system (3C) at substrate temperatures greater than 773K. Cubic SiC–TiC nanocomposite thin films, which contain a mixture of 3C-SiC and B1-TiC phases, were obtained at a TiC content of greater than 20mol%. The amorphous films possessed a dense cross-section and a smooth surface. The morphology of the SiC–TiC nanocomposite thin films changed from granular to columnar with increasing substrate temperature. The SiC–TiC nanocomposite thin films prepared at TiC content of 70–80mol% and substrate temperature of 573K showed the highest hardness of 35GPa.