Abstract
Abstract Ferroelectric PbTiO3 thin films have been epitaxially grown on (100) NaCl cleavage surface by MOCVD using tetraethyllead and titanium isopropoxide as precursors. The microstructures and epitaxial characteristics of as-grown thin films were investigated by means of transmission electron microscopy. TEM studies have shown that the epitaxial thin film was highly (001) oriented and even near single-crystal epitaxy if without a small volume of 45° rotated grains, the average grain size is around 1000 A. Lowangle grain boundary formed universally when islands coalesced during the early stage of epitaxial growth. A possible growth mechanism has been given to explain this epitaxial phenomenon by consideration of two-dimensional coincidence superlattice. 90° ferroelectric domains were also observed both in the large matrix grains and small 45° rotated grains.
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