Abstract
Hybrid patterning by thermal and UV nanoimprint lithography (NIL) is demonstrated to fabricate micro and nano mixed structures. The SU-8 resist is thermally imprinted using a quartz mold, which has fine nanostructures and micro Cr mask patterns. After the thermal nanoimprint, UV light is exposed to the resist through the mold. Then, the mold is released and the resist is developed to fabricate microstructures. Using this process, nanodots having 200nm feature sizes are successfully demonstrated on the microgratings with 40μm width and 20μm height. Also, fabrication of nanocorn array on the bottom of the deep microwell is demonstrated using Ni mold replicated from the resist master structure fabricated by the hybrid NIL.
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Schedule a callMore From: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
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