Abstract
Finely focused ion beams with current densities on the order of one A/cm2 with beam diameters as small as 0.1 μm are used in a wide variety of surface processing applications in microelectronic research. Some of the techniques include scanning ion microscopy and high spatial resolution SIMS, micromachining by physical sputtering, ion beam induced surface chemistry for etching and deposition, maskless implantations, and lithography. The primary commercial application to date has been defect repair for photomasks although integrated circuit modification for diagnostic purposes is emerging as important. Focused ion beams have also been applied to III–V materials for in situ processing, lithography, and fabrication of integrated optics devices by micromachining. Several focused ion beam techniques and applications will be reviewed. Particular emphasis will be placed on micromachining, deposition, and SIMS techniques.
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