Abstract
Microelectromagnetic matrix fabricated by lithography patterning on Si chip for the manipulation and assembling of nanoparticles (NP) by local magnetic field created by current loaded thin film conductors is described. Co, Fe3O4 and CoFe2O4 NPs are manipulated by matrix elements - meanders, grids and ring traps loaded at the electromigration limit of Ag conductors. The design of matrix is based on calculations of magnetic field over the elements covered by polyimide layer. Amorphous silicon is used as a manipulation surface
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