Abstract
A possibility of using an X-ray from incident ions in micro PIXE measurement with MeV heavy ions was discussed. To reveal the feature, a Cu-Ti plate was analyzed by a 5 MeV silicon and a 5 MeV nickel ion microprobe and the PIXE-mapping images of the X-rays from the incident ions were compared with the normal PIXE-mapping images of the X-rays from the target. These images indirectly reflected the distribution of a specific element with good statistics.
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