Abstract
The compound TbFe2 and SmFe2 are known to exhibit the largest positive and negative magnetostriction, receptively. Thin fllms prepared by magnetron sputtering process were obtained film structure showed by Thornton model. The change of this film structure was expected influence of magnetostriction properties. SmFe alloy thin films were prepared by D.C. magnetron sputtering process at different substrate temperatures from 323 K to 623 K and at different argon gas pressure of 0.5 and 0.8 Pa. A magnetostriction of the Sm-Fe alloy film increased with decreasing gas pressure on sputtering. The maximum value of magnetostriction over 1300 ppm at 1.0 MA/m was found in a Sm-Fe film prepared at 423 K of substrate temperature below crystallization temperature and at 0.5 Pa of argon gas pressure.
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