Abstract
Cu/Ni/Cu heterostructures have been in situ deposited on the 7×7 reconstructed Si(111) surface. A number of complementary techniques, such as in situ low-energy, medium-energy and Kikuchi electron diffraction and ex situ X-ray diffraction, were used in order to characterise the growth process and the structural properties of the films. It is found that the growth mode of metallic films is characterised by the presence of twinned islands induced by the 7×7 reconstruction of the Si(111) substrate. This work can stimulate further application of the metal–metal epitaxy on silicon to grow high quality ultrathin magnetic films to be integrated in microelectronic devices.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
