Metal-Masked Mie-Resonant Full-Color Printing for Achieving Free-Space Resolution Limit

Abstract

Mie resonance wavelengths of a dielectric structure are strongly dependent on the inherent material property and structural geometry. In particular, a high-index nanostructure enables light confinement within itself over the range of visible wavelengths, which allows the Mie resonator to be applied to a pixel in color printing of subwavelength-scale resolution. However, if the Mie resonator is packed into a smaller area in order to achieve better resolution, the interaction between adjacent resonators occurs depending on these spatial distances, leading to unexpected color changes. Here, we demonstrate metal-masked Mie-resonant color printing for suppressing undesirable color changes. We observed that the interaction between monocrystalline Si resonators can be suppressed by the addition of a Cr mask. The pixels with this functionality can produce individual colors even if operating as a single element or in other periodic arrays, resulting in the realization of higher resolution encoding. The coincidence...