Abstract
Using a microwave‐excited plasma source based on a microstrip line, we have generated a nitrogen plasma jet at a moderate pressure in the range from 1 to 10 kPa. The densities of nitrogen (N) atoms produced by the plasma jet were measured with a vacuum ultraviolet absorption spectroscopy. The results show that the plasma jet is able to provide a high density of N atoms at least 4.5 × 1014 cm−3 at 1.5 kPa. The N atom densities vary widely with the change in gas flow rate and substrate placement. We expect that this plasma source will provide a high performance as an advanced N radical source in various applications. © 2020 Institute of Electrical Engineers of Japan. Published by Wiley Periodicals LLC.
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