Abstract
A 60 Hz alternating current excited atmospheric-pressure plasma with an ultrahigh electron density of over 1016 cm-3 employing H2/Ar [ p(H2)/p(H2+Ar) 1–3%] gases was used to reduce copper oxides on copper. The remote plasma reduced CuO and Cu2O at room temperature. The ground-state hydrogen (H) radical density in the atmospheric-pressure plasma was measured by vacuum ultraviolet absorption spectroscopy using a micro hollow cathode lamp. The ratio of reduction of amount of CuO flux to the H radical flux was determined from the measured H radical density and gas temperature.
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