Abstract
Rigorous electromagnetic field simulations are applied to investigate phase effects in the light diffraction from masks for advanced optical and extreme ultraviolet lithography. Analogies of these phase effects with wave aberrations of the projection lens and their impact on the lithographic process performance are discussed.
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Schedule a callMore From: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
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