Abstract
Magnetic and structural properties of MnBi films with thicknesses up to 50 nm were investigated. Thin films of the MnBi LTP (Low Temperature Phase) were fabricated onto silica-glass substrates by sputter-deposition of Bi/Mn multilayer, followed by a subsequent annealing at about 550 °C for 30 min. Coercivity of such thin films is higher than 15 kOe, even though the film thickness is about 10 nm. These thin films show the preferential growth of c-axis of the LTP along the film normal. Moreover, high resolution transmission electron microscopy indicates that the LTP regions of 30–50 nm in size are physically isolated by Bi. The magnetization reversal mechanism of such a LTP region is mainly governed by a coherent rotation mode based on the δM curve measurement.
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