Abstract
Light scattering is a sensitive method for characterizing the topography of a smooth, reflecting surface. Particulate contaminants which may influence the yield of semiconductor devices are easily detected in scattered light. Surface irregularities which may influence the lifetime or mobility may be quantitatively evaluated by scattering. The total integrated scatter (TIS) fromoa silicon surface can be related to the rms surface roughness with a sensitivity of 10 Å. Some applications of light scattering to the char-acterization of silicon will be summarized. The TIS method for measuring the surface roughness will be presented in detail.
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