Abstract
The atmospheric pressure low-temperature homogeneous discharge using helium and nitrogen, both known for industrial applications, was reviewed. In case of helium, metastable atoms (21s and 23s) produced in the glow discharge were able to dissociate mixed molecular gases to produce radicals or atoms. Radical species undergo chemical reactions, such as oxidation or nitration reaction and form products on the electrode surfaces. Applications of helium atmospheric pressure glow discharge including surface treatment of plastic films to enhance adhesibility with glue, weakening strength with pressure-sensitive glue, and deposition of solid material on a flat plate or powder surfaces, were described. Moreover, the microwave low-temperature discharge using nitrogen, as a cost-saving carrier gas, were introduced for the surface cleaning of silicon wafer.
Highlights
Introduction to the Atmospheric Pressure GlowDischarge (APGD)Plasma chemical vapor deposition (CVD) and etching or surface treatment using glow discharge in low pressure are experimental techniques widely applied in hightechnology research industries
We concluded that the surface fluorination of polyethylene terephthalate (PET) by Atmospheric Pressure GlowDischarge (APGD) could prevent the peeling from the treated layer
We suppose that the reason of high deposition rate in APGD is attributed to no ion effect on the surface, because the fast ion impact in the low-pressure glow discharge will bring the etching effect for the deposition film
Summary
GCDR Gas-phase chemical derivatization HFP Hexafluoropropylene H.V. High voltage IAA Tris(2,4-pentanedionato)iron PE Polyethylene LDPE Low density PE LF Low frequency LPD Low pressure discharge NY Nylon PCR Polymerase chain reaction PEG or PEO Polyethylene glycol PET Polyethylene terephthalate PFA Perfluoroalkoxy alkane PFBA Pentafluorobenzaldehyde PP Polypropylene PSA Pressure-sensitive adhesive PTFE Polytetrafluoroethylene PVC Polyvinylchloride RF Radio frequency (13.56 MHz) SEM Scanning electron microscope TEM Transmission electron microscope Td Townsend, 1 Td = 1 × 10–17 V·cm TFAA Trifluoroacetic acid TFE Tetrafluoroethylene UT Untreated VOC Volatile organic compound XPS X-ray photoelectron spectrometry reactions (2021) 5:3. There is yet for commercial use since the operations are done in a vacuum system the apparatus will be extraordinarily expensive Plasma application, such as the surface treatment on largesized film materials in low pressure was not so easy in practice. The atmospheric discharge in helium, the reduced electric filed at the ionization region that is near of the starting voltage is at most 30 Townsend (1 Td = 1 × 10–17 V·cm2) or so which is much lower than that of the nitrogen (− 1000 Td) In this case, since the multiple ionization proceeds rather slowly, the discharge will not be non-uniform like as in a streamer discharge. Several applications, such as surface treatment of plastic films, silica deposition on the powder materials and so on, will be described which have been achieved by the author’s group using the APGD system
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