Abstract
To improve the optical performance of Fresnel lenses, a technique for preparing them with antireflective structures of the moth-eye type is developed. Masters featuring such hierarchical structures are prepared in SU-8, a negative tone photoresist, by two consecutive thermal imprint steps. The moth-eye structures imprinted first are vacuum ultraviolet-treated at 172 nm to provide a surface-near the cross-linked layer that remains stable during the second imprint of the 100 μm sized Fresnel structures. A successful combination of both structure types is possible at an imprint temperature as low as 45 °C. This can be understood on the basis of the typical exposure and the crosslinking behavior of a chemically amplified negative tone resist like SU-8. The masters prepared in this way will be subjected to extrusion coating, the process of choice for future large area preparation of such structures in a single step.
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More From: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
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