Abstract
We studied the location control of a giant grain of polycrystalline silicon produced by Ni-mediated crystallization of amorphous silicon (a-Si) using a cap layer. An organic lens made of acryl was used for the focusing of light for the seed formation and subsequent crystallization. A single grain 62μm in diameter was made using an 80-μm-square SiNx cap layer on the a-Si. The position of a thin-film transistor (TFT) on a grain can be controlled, so that a single grain TFT can be fabricated at a predetermined position without use of the laser annealing technique.
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