Abstract

Liquid reagent CVD of carbon was performed where the substrate was immersed in liquid benzene and cyclohexane. A kinetic analysis showed the deposition rates obeyed the Arrhenius relationship with apparent activation energies of 280 and 263 kJ/mole, respectively. Deposition rates were highest for benzene. A simple analysis of heat and mass transport based on film boiling theory was performed to achieve fundamental understanding of the process and to define the rate limiting mechanism. It was demonstrated that the hydrogen inhibition effect can be neglected for the liquid reagent CVD process and a high precursor concentration near the substrate surface is achievable, which permits a high deposition rate.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.