Abstract
This study presents the room-temperature operation of deep-trench type nitride–oxide metal–insulator–semiconductor three-terminal tunneling devices which were fabricated by a standard metal–oxide–semiconductor process. It is instructive to observe a photoinduced N-type negative differential resistance (NDR) with a high peak-to-valley current ratio for device operated under negative polysilicon node bias under tungsten lamp illumination. An explanation was provided for the NDR phenomenon with proper three-terminal biasing. The sudden current drop under light illumination was caused by the sudden reduction of the two-carrier conduction due to Esaki band-to-band tunneling. The NDR amplitude could be modulated by light intensity. The position of the NDR current peak was tunable at different voltages with different p-well biases. The optoelectronic response of nitride–oxide devices we investigate here may open an application window for the nitride–oxide system in silicon-based optoelectronic integrated circuits, wireless communications, and future quantum devices.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
