Abstract
Laser-induced crystallization of SiGe was investigated using a crystallization technique of pulsed excimer KrF laser irradiation on a-SiGe films that were prepared by plasma-enhanced chemical vapor deposition on quartz. The crystallized SiGe sample was investigated by scanning electronic microscopy (SEM); the SiGe microcrystals are 0.5 μm in size and embedded in the a-SiGe:H matrix. Strong photoluminescence with two peaks at 720 and 750 nm was observed at room temperature in the crystallized film, whereas the uncrystallized a-SiGe:H films emit do not emit light in the visible range. This indicates that laser-induced crystallization can be used to improve the luminescence efficiency for Si-based materials.
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