Abstract
This work reports a systematic study of the growth of copper oxide thin films by laser evaporation from a Cu foil or a Cu sintered powder target in an oxygen atmosphere. The experimental conditions to deposit Cu 2O and CuO thin films are determined. Particle-free single-phase films are obtained from the foil target. The laser-deposited films have good optical properties. For comparison, DC-sputtered films deposited from the same Cu foil were studied. To obtain the same phase the former method requires higher oxygen pressure during deposition. The microstructure formed in the laser-deposited samples is always polycrystalline with a homogeneous grain size whereas sputtering can form columnar growth.
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