Abstract
LaAlO3 (LAO)/SrTiO3 (STO)/LaAlO3 (LAO) heterostructures were epitaxially deposited on TiO2-terminated (100) SrTiO3 single-crystal substrates by laser molecular beam epitaxy. The electron Hall mobility of 1.2 × 104 cm2/V s at 2 K was obtained in our trilayered heterostructures grown under 1 × 10-5 Torr, which was significantly higher than that in single-layer 5 unit cells LAO (∼4 × 103 cm2/V s) epitaxially grown on (100) STO substrates under the same conditions. It is believed that the enhancement of dielectric permittivity in the polar insulating trilayer can screen the electric field, thus reducing the carrier effective mass of the two-dimensional electron gas formed at the TiO2 interfacial layer in the substrate, resulting in a largely enhanced mobility, as suggested by the first-principle calculation. Our results will pave the way for designing high-mobility oxide nanoelectronic devices based on LAO/STO heterostructures.
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