Abstract
Fabrication of large-area, highly orderly, and high-resolution nanostructures in a cost-effective fashion prompts advances in nanotechnology. Herein, for the first time, we demonstrate a unique strategy to prepare a long-range highly regular polymer lens from photoresist nanotrenches based templates, which are obtained from underexposure. The relationship between exposure dose and the cross-sectional morphology of produced photoresist nanostructures is revealed for the first time. The polymer lens arrays are repeatedly used for rapid generation of sub-100 nm nanopatterns across centimeter-scale areas. The light focusing properties of the nanoscale polymer lens are investigated by both simulation and experiment. It is found that the geometry, size of the lens, and the exposure dose can be deployed to adjust the produced feature size, spacing, and shapes. Because the polymer lenses are derived from top-down photolithography, the nearly perfect long-range periodicity of produced nanopatterns is ensured, and the feature shapes can be flexibly designed. Because this nanolithographic strategy enables subwavelength periodical nanopatterns with controllable feature size, geometry, and composition in a cost-effective manner, it can be optimized as a viable and potent nanofabrication tool for various technological applications.
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