Abstract
Kramers-Kronig analysis is developed for reflection-absorption spectroscopy which removes prior thin film approximations and includes interference effects. The interference effect is shown to be present even in reflection-absorption spectra of thin films less than 10 nm. The errors in the complex refractive index obtained from the simulated reflectivity by Kramers-Kronig analysis have been examined for ordinary reflection-absorption spectroscopy as well as metal overlayer attenuated total reflection spectroscopy. The complex refractive index normal to the surface of a thin film on a metal can be obtained, although knowledge of the refractive index for the material at a frequency with no dispersion and the thickness of the thin film are necessary for properly discriminating the interference effects. This new method may be applied to other cases such as thin films on an absorbing substrate as well as on a transparent medium.
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