Abstract
In the fabrication of high quality optical coatings, proper stoichiometry is an important requirement. In particular, metal oxide films should be free of suboxides or metal that could increase absorption in the film. However, decomposition of the film starting material during deposition is a common problem, and in the case of metal oxides this is often severe. Because of this, various techniques of reactive deposition have been developed over the last decade to improve the film stoichiometry. One such technique that has received attention lately is ion-assisted deposition, in which a beam of oxygen ions is directed onto an optic during film deposition.
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