Abstract
In this paper we present some results on medium energy ion beam induced microstructural modifications in pulsed laser deposited tungsten carbide films and their effects on the microhardness of the material. Thin films of tungsten carbide were deposited by laser ablation from “WC” compound. These films were subsequently implanted with 80 keV N+2 ions at various dose levels. Variations in the microstructure and phase precipitation were studied by using low angle X-ray diffraction. Scanning electron microscopy was also used for characterization. After every stage of processing, the microhardness of the sample was monitored using Knoop's indentation technique. Ion beam induced recrystallization in as-deposited amorphous thin films, an increase in the microhardness of the film at an optimum ion dose of 3 × 1016 ions cm−2, and their correlation to structural and morphological features are the main interesting results of this study.
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