Abstract
Synthetic quartz was exposed to 3 MeV N + ions at fluences ranging from 4 × 10 13 N +/cm 2 to 2 × 10 16 N +/cm 2 and was then examined by transmission electron microscopy. Electron micrographs revealed the presence of defect clusters and selected area diffraction showed a loss in crystallinity with increasing ion fluence. The extent to which these defects could be removed by annealing depended upon the ion fluence. Dauphiné twins which formed upon cooling from temperatures above the alpha-beta inversion temperature were smaller and more numerous than in the undamaged material. After annealing to 790°C and cooling, the twins which formed were larger because of removal of much of the damage.
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