Abstract
Directed energy in the form of energetic ion beams is an excellent tool for the modification of thin film and interface properties. The easy control of ion beam parameters causes the high flexibility of the technique. The influence of ion bombardment during deposition of thin films and coatings (IBAD) on their mechanical and chemical behaviour is reviewed in this article. Firstly the controlled production of IBAD films or multilayers with well defined composition is described. Secondly the influence of ion bombardment on selected properties is considered. Adhesion, stress and structure or texture and their dependence on process parameters are discussed. Thirdly the role of adhesion, stress and porosity of films for their use for corrosion and oxidation protection is treated. Finally in the conclusion an attempt is made to define the present status of IBAD techniques compared with other PVD processes.
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