Abstract
Structural phase transformation of pure-HfO2 films to higher-k phase (cubic or tetragonal phase) is discussed in terms of both doping effect and dynamic post-deposition annealing (PDA). Y2O3 and SiO2 were doped into HfO2, while the rapid thermal treatment was performed, respectively. It was demonstrated that the k-value of cubic-HfO2 was ~30 in doped case, while ~50 in dynamic PDA case. A kinetic analysis of the recovery process from cubic to monoclinic phase in the dynamic PDA HfO2 was performed according to the Johnson-Mehl-Avrami law.
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