Abstract
Plasma ion assisted deposition (PIAD) is a common method for the production of high-end optical interference coatings (OIC). Conventional process control is based on operating parameters like gas fluxes, voltages or currents, while the actual state of the assist plasma is specified imprecisely. The concept of active plasma resonance spectroscopy (APRS) employing the Multipole Resonance Probe (MRP) allows to access plasma conditions in industrial coating environments. This study presents results on the investigation of conventional and APRS-based control concepts for a multilayer OIC, a 36-layer polarizer made of SiO2 and Ta2O5. Process repeatability and its impact on Laser Induced Damage Threshold (LIDT) are addressed.
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