Investigation on P-N dual acceptor doped p-type ZnO thin films and subsequent growth of pencil-like nanowires

Abstract

Phosphorous and nitrogen dual acceptor doped p-type ZnO (PNZO) have been deposited by spray pyrolysis method on glass substrates. An equimolar doping concentration of P and N were varied from 0.25–1.25 at% with a step of 0.25 at%. Preferred orientation along (002) planes with hexagonal wurzite structure was observed from structural analysis. Morphological analysis reveals uniform distributions of grains. Electrical studies showed dual acceptor doping of P and N in ZnO results in p-type behavior. The optimum doping concentration of P and N was found to be 0.75 at% which exhibited hole concentration of 4.48 × 1018 cm−3 and low resistivity value of 9.6 Ω.cm. Photoluminescence (PL) studies revealed that, as-deposited films exhibit strong UV emission at 383 nm of the spectrum. The surface morphology of the optimum PNZO (0.75 at%) samples were further modified in the form of vertically aligned pencil-like nanowires by modified aqueous chemical growth (ACG) process. During ACG process, more acceptor related defects such as oxygen interstitials (Oi) were formed in the PNZO nanopencils. These acceptor defects induce enhanced emission in the visible region (400 nm to 700 nm) and also promote stable p-type characteristics.