Abstract
In this paper, a PVDF film sensor was used to measure the transient responses of a cantilever beam subjected to an impact loading. The measurement capability of a PVDF sensor is affected by the area of the PVDF film sensor and the signal conditioner (charge amplifier). The influences of these effects on the experimental measurements were investigated. The transient responses for the dynamic strain of the beam were measured simultaneously by the PVDF sensor and a conventional strain gauge. The resonant frequencies of the beam were determined by applying the Fast Fourier Transform on transient results in the time domain of the PVDF sensor and the strain gauge. The experimentally measured resonant frequencies from the PVDF sensor and the strain gauge were compared with those predicted from theoretical and FEM numerical calculations. Based on the comparison of the results measured for these two sensors, the PVDF film sensor proved capable of measuring transient responses for dynamic strain, and its sensitivity is better than that of the strain gauge. Furthermore, almost all the resonant frequencies can be obtained from the results of transient responses for PVDF film.
Highlights
The phenomenon of polymorphism of polyvinylidene fluoride (PVDF) has been investigated since the1960s [1,2]
The sensitivity and accuracy of PVDF sensors presented in this study demonstrate their excellent characteristics in measuring dynamic strain in transient situations
The transient responses, which were excited by the impact of a steel ball, were measured by a PVDF sensor and a strain gauge simultaneously
Summary
The phenomenon of polymorphism of polyvinylidene fluoride (PVDF) has been investigated since the1960s [1,2]. Four structures of PVDF were observed, and the three common notations used for indicating these structures are {I, II, III, IV}, {β, α, γ, δ}, and {I, II, III, IIp} [3,4]. The spin-coating method [10,11] has been reported for obtaining thin films of β-PVDF. This technique allows the fabrication over large area on the substrates. High-quality films with controlled thicknesses from 300 nm to 4.5 μm can be obtained in a single deposition step using the spin-coating method [12]
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