Abstract
The IR reflection spectra of nitrided layers of the TF10, TF5, and TF8 glasses are analyzed. It is shown that thermal nitridation of the surface layers of the glass samples at a temperature of 375–495°C and a pressure of 0.1–1.0 MPa for 1–20 h brings about the breaking of the Si-O-Si bonds and the formation of the Si-N-Si and Si-N bonds. The degree of structural transformation in the surface layer depends on the conditions of thermal nitridation and on the chemical composition of the glass.
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