Investigation of the Reaction of Compound Formation in the Reactive Evaporation Process

Abstract

The reactions in the reactive evaporation process have been studied by using a quadrupole mass analyser. Experiments were carried out in systems of Ti-C2H4 and Al-NH3. Films of the various composition have been obtained by changing the ratio of the incident frequency of both active gas molecules and evaporated metal atoms onto the substrate. By taking account of the results of mass analysis and the effects of the substrate temperature on the composition of products, it may be concluded that the formation processes have dominantly proceeded on the substrate. The reactions seem to be taking place between the adsorbed molecules and/or atoms on a substrate. At relatively higher substrate temperatures, above about 300°C, the main processes are simple reactions caused by the direct collisions between metal atoms and gas molecules during the migration on the growing film surface.