Investigation of the argon temperature modes in ICP-processing of glass-ceramics

Abstract

Thermal modes of the argon inductively coupled plasma stream (13.56 MHz) were investigated with the respect to macroscopic parameters. The pressure in the vacuum chamber was varied from 10 to 80 Pa and the RF generator power from 500 to 2500 W. Thus, the radial temperature distribution in the stream was studied at different distances from the plasma torch. It was established that the temperature of the plasma-forming gas can reach 800 °C at the center of the stream and smoothly decreases to the periphery. Specific heat capacity and the heating rate of a two-phase, SiO2 based, glass-ceramic material were investigated in the plasma stream with different plasma parameters.Thermal modes of the argon inductively coupled plasma stream (13.56 MHz) were investigated with the respect to macroscopic parameters. The pressure in the vacuum chamber was varied from 10 to 80 Pa and the RF generator power from 500 to 2500 W. Thus, the radial temperature distribution in the stream was studied at different distances from the plasma torch. It was established that the temperature of the plasma-forming gas can reach 800 °C at the center of the stream and smoothly decreases to the periphery. Specific heat capacity and the heating rate of a two-phase, SiO2 based, glass-ceramic material were investigated in the plasma stream with different plasma parameters.