Abstract
Zirconium dioxide thin films were deposited onto fused silica glass substrates by electron-beam assisted by oxygen ions using high vacuum coater equipped with electron beam gun at ambient substrate temperature. The properties of the films have been investigated using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), micro-hardness testing, laser induced damage threshold (LIDT) and optical analysis. It is found that the crystalline phase is strongly influenced by ion energy and current density and an amorphous to monoclinic transition is occurred. The changes in crystallinity resulted in increase in the film micro-hardness up to19GPa, revealed in minimum residual stress -2GPa. LIDT increased up to 19 J/cm2 and the optical refractive index improved up to 2.23 at 550 nm wavelength for films deposited at ion energy of 400eV and 100μA/cm2 current density.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: International Journal of Precision Engineering and Manufacturing
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
