Abstract

The kinetics and the mechanism of dissolution of fresh and illuminated chalcogenide layers from the Ge-Sb-S system have been investigated by the turn-table method. The relative roles of surface chemical reaction and diffusion in the heterogeneous dissolution process vs the layer composition have been established. Addition of a surface active substance (SAS) with cation-active organic nitrogen group to the alkaline solvent changes the dissolution kinetics. The selective influence of SAS at the topological phase transition of the structure allows to control the process of dissolution of the chalcogenide films.

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