Abstract
Silicon provides as a particular advantage the monolithic integration of optical circuits, photodiodes, microelectronic circuits and micromechanics for electronical-optical-micromechanical microsystems. The optical waveguiding layers are fabricated by Plasma Enhanced Chemical Vapor Deposition (PECVD) for a compatibility with CMOS-processes and optical strip waveguides are delineated by Reactive Ion Etching (RIE). The technology, the waveguides and their characterization are demonstrated.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.