Abstract
FeCrAl thin films are considered optimal candidates for protecting surfaces in harsh environments, with potential for improvement in their anti-oxidation properties by incorporating beneficial dopants such as Nb and Si. However, the thermodynamic mechanism responsible for this improvement remains unknown. This study investigates the impact of Nb and Si additions on the growth mechanism of oxide formation during the initial stage of 1000°C air exposure. Spectroscopic analyses indicate the inception stage is characterized by the formation of α-Al2O3, accompanied by the generation of Cr-, Nb-, and Si-containing oxides. Thermodynamic calculations reveal that the additions of both Nb and Si can stabilize the phase structure of the thin films before oxide scale formation occurs, slowing down oxidation rates. Nb is shown to increase Cr activity, while Si enhances Al activity, promoting the formation of Cr-rich and Al-rich oxides respectively. This contributes to improvements in the thin films’ anti-oxidation properties. Overall, this research sheds light on the origin of the improved oxidation resistance of FeCrAl thin films containing Nb and Si.
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