Abstract
HAp nucleation from SBF was investigated in this study on Si substrates on which various kinds of organosilane SAM were formed. Saturation of number densities of HAp particles was found in the early stage of HAp deposition process while particles continued to grow after saturation. Slight dependence of the kind of organosilane SAM was also observed on particle number density. Depletion of calcium and phosphate ions in the vicinity of a substrate should limit nucleation. The minimum ionic concentration for HAp nucleation depends on the kind of SAM.
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