Abstract
Quantitative depth profiling and compositional analysis of oxygen in TiOx film deposited on K9 glass was carried out using the resonant elastic scattering 16O(α, α)16O at 3.045 MeV. By means of the resonance yield, the oxygen concentration in TiOx films as well as the oxygen-to-metal stoichiometry as a function of the depth probed can be deduced. TiOx films deposited by electron-beam evaporation at different oxygen partial pressures were analyzed, and it is shown that the oxygen concentration in the films is homogeneous. Oxygen partial pressure in the process of evaporation drastically affects the oxygen concentration in the films, and the refractive indices and the extinction coefficients of the films decrease with the increasing oxygen concentration in the films. Under our deposition conditions, we found that 1.6 × 10—4 Torr is the optimum value of oxygen partial pressure for forming TiO2 films by the electron-beam evaporation method. At this oxygen partial pressure, we can prepare an excellent band-pass filter.
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