Abstract
The interaction of polymethylmetacrilate (PMMA) hard films with synchrotron radiation (SR) has been studied by atomic force microscopy (AFM). It has been found that the roughness changes from 1.85 to 2.98 nm with an increase in the irradiation time for the selected beam with the energy corresponding to the hard X-ray region λ = 0.2 nm. The roughness decreases from 6.41 to 2.36 nm with an increase in the irradiation time from 1 to 17 min when photons with a lower energy are used. The interaction of radiation with PMMA leads to the appearance of nanohillocks, the average diameter and height of which depend directly proportionally on the spectral composition and SR exposure time. The revealed effects of interaction of synchrotron radiation with PMMA will help to correct the X-ray lithography conditions in electron engineering (PMMA is the basis for X-ray resist) and will allow one to control the roughness degree of the PMMA surface that is the basis for intraocular lenses.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
