Abstract
Abstract Among the techniques developed for depositing thin films, metal-organic chemical vapor deposition is one of the most promising. In the present work, the deposition of TiO2 thin films on stainless steel, titanium, barium borosilicate glass and alumina substrates, using titanium tetraisopropoxide as a precursor, was investigated. The films were deposited at 420 °C. The resulting film phase, checked by X-ray powder diffraction, was found to be polycrystalline anatase and was oriented with the a axis perpendicular to the substrate surface, except for alumina substrates where titania films were randomly oriented. Some considerations on texture and crystallite size as a function of film thickness are reported. Annealing up to 1100 °C induced the complete anatase-rutile transformation on alumina substrates.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
