Abstract
The paper considers the effect of silicon on the formation of the structure and properties of amorphous diamond-like carbon (DLC) films. Thin films of silicon-modified amorphous diamond-like carbon (DLC:Si) were synthesized by magnetron ion-plasma co-sputtering of a combined target. Studies of the structure and properties of amorphous DLC:Si films were carried out in the range of silicon concentrations up to 6.75 at.%. A change in the formation of the film structure is shown using atomic force microscopy (AFM) and transmission electron microscopy (TEM). Raman spectroscopy (RS) and X-ray photoelectron spectroscopy (XPS) revealed a significant change in the local structure of amorphous DLC:Si films. Which, in turn, leads to a change in the density of states of π-electrons in the band and, as a rule, to a change in the electronic properties.
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