Abstract
Ferroelectric properties of hafnium-based thin films have gained significant interest, yet the fundamental mechanisms responsible for the emergence of the ferroelectric phase continue to be inadequately investigated. In contrast with polycrystalline films fabricated by atomic layer deposition or sputter methods, which possess uncertainty in polarization orientation, epitaxial ferroelectric HfO2-based materials are less investigated, especially for factors such as electric field and oxygen vacancy, which are proposed and examined for their potential impacts on phase stability. In this study, Y-doped hafnium oxide (HYO) ferroelectric epitaxial films were fabricated using pulsed laser deposition, with variations in oxygen pressure during the deposition process. Structural and electrical analyses of HYO epitaxial ferroelectric films prepared under differing oxygen pressures revealed a correlation between the ferroelectric properties of the films and the oxygen content. An optimal selection of oxygen pressure was found to be conducive to the formation of HYO epitaxial ferroelectric films, presenting a promising avenue for future ferroelectric memory applications.
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