Abstract
TiAlN/Al2O3 multilayers with different Ar/N2 ratios were deposited on Sisubstrates in different N2 partial pressure by magnetron sputtering. The crystalline and multilayer structures of the multilayers were determined by a glancing angle X-ray diffractometer (XRD). A nanoindenter was used to evaluate the hardness, the elastic modulus and scratch scan of the multilayers. The chemical bonding was investigated by a X-ray Photoelectron Spectroscopy (XPS). The maximum hardness (36.3 GPa) and elastic modulus (466 GPa) of the multilayers was obtained when Ar/N2 ratio was 18:1. The TiAlN/Al2O3 multilayers were crystallized with orientation in the (111) and (311) crystallographic planes. The multilayers displayed stably plastic recovery in different Ar/N2 ratios. The scratch scan and post scan surface profiles of TiAlN/Al2O3 multilayers showed the highest critical fracture load (Lc) of 53 mN for the multilayer of Ar/N2 = 18:1. It indicated that the multilayer had better practical adhesion strength and fracture resistance.
Highlights
The multi-element systems, in recent years, have received more attention in terms of further improving performance [1,2,3]
Clear reflection peaks are observed in X-ray reflectivity (XRR) pattern of TiAlN/Al2O3 multilayer, indicating that the multilayer has distinct chemical modulation structure and sharp interfaces
Sharp interfaces between the two layers throughout whole multilayer can cause an enhancement in hardness
Summary
The multi-element systems, in recent years, have received more attention in terms of further improving performance [1,2,3]. When individual layer thicknesses approach nanometer dimensions, the hardness of multilayers is generally enhanced over the rule-of-mixture values, typically by a factor of two. As the layer thickness and crystallite size approach nanometer dimensions, dislocation generation becomes energetically unfavorable Both factors make multilayers stronger than expected from the rule of mixtures [8]. Pronounced strength enhancement, optimal hardness/toughness ratios and excellent wear resistance can be obtained through a proper critical bilayer thickness design for nanoscale multilayers [11,12,13]. These coatings can be deposited by physical vapor deposition (PVD). Films synthesized using PVD usually have compressive stresses [15]
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