Influence of N+ ion implantation at different temperatures on nanostructural modifications and characteristics of Al alloy surface

Abstract

Thick (3.0 mm) Al samples (7049 an alloy with 15 elements) were implanted by N+ ions of 30 keV energy and fluence of 5 × 10 17 N+ cm−2 at different temperatures. The surface modification of the samples was studied using X-ray diffraction (XRD) and atomic force microscope (AFM) analysis. XRD spectra of the samples clearly showed the formation of different phases of AlN. Crystallite sizes (coherently diffracting domains) obtained from AlN diffraction lines showed that at a certain substrate temperature the crystallite size decreases considerably. AFM images showed the formation of grains on Al samples, and it was observed that both grain size and sample surface roughness first decrease and then increase with temperature (i.e. a minimum at a certain temperature is observed). In addition at this temperature, a minimum of intensity is also observed for the intensity of different phases of AlN and the intensity ratio of AlN (200)/AlN (311). This phenomenon is similar to those obtained for thin films and pure metal foils though the sample studied in this work is an Al alloy and the minimum for Al occurred at a value three times larger than that reported for the above cases. Alloy nature of this sample with 14 elements is responsible for the observed results because they may act as defects. Results may also be affected by the residual gases, substrate temperature, dissociation of water in the chamber and the ion energy. Results also showed that the processes of Al nitride and Al oxide formations are competing with each other; decrease of aluminium nitride phases are associated with increase of aluminium oxide phases.