Abstract
The comparison between different chelating agents in sol‐gel process for deposition of nanostructured Titanium Dioxide (TiO2) thin film has been studied. Glacial Acetic Acid (GA) and Nitric Acid (NA) were used in 0.2 M of concentration. The effects to the structural, electrical and optical properties have been studied. The effects of these properties were characterized using X‐Ray Diffractometer (XRD), 2‐point probe I‐V measurement and UV‐Vis‐NIR Spectrophotometer. For electrical properties, it showed that nanostructured TiO2 thin film that using GA (TF‐GA) as chelating agent gives better low sheet resistance compare to nanostructured TiO2 thin film using NA (TF‐NA). From XRD results, it indicates that no significantly different between both TiO2 thin film. Both of thin films have crystalline anatase phase at 2θ degree 25.8° which corresponded to (101) orientation. For optical properties, sol‐gel using GA has slightly higher in transmittance spectra properties but both of films fully absorbed UV light at 300 nm of wavelength. As for optical band gap, both sol‐gels using GA and NA has similar optical band gap which is 3.27 eV.
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