Abstract
Zinc oxide (ZnO) thin films were deposited on Si (100) substrate through sputtering of zinc by DC magnetron, followed by thermal oxidation. Different deposition rates were used in coating films with 100 nm thickness (0·6–4·5 nm/s). Photoluminescence spectra of the produced samples were obtained and it was found that the violet emission peak intensity increases with deposition rate. Scanning electron microscopy (SEM) micrograph and atomic force microscopy (AFM) images for the zinc oxide films were obtained. Morphological changes due to various deposition rate are discussed in the light of changes observed in the ZnO crystals. Low coating rates produced smooth surface with small grains while higher deposition rates increased the surface roughness and larger grain size. AFM and SEM results are in good agreement and support the PL results.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
